Clean Room (MNCR)

The CVC is a cryo pumped high vacuum system for PVD sputtering of conductive targets. Up to 8” substrates can be processed and four targets are concurrently installed for use serially.

No toxics. 

This probe station makes quick, non-permanent, compression connections to microfluidic devices. High precision, programmable pumps can deliver minute constant controlled flows or flows with biomimetic modulations. A microscope and video capture system can document flow parameters and visualizations.

No solvents. 

The Bruce is a high temperature, three tube, atmospheric, horizontal furnace.  It can accept up to 5” wafers and has a maximum operating temperature of 1100C.  Tube 1 is dedicated to CMOS compatible dry oxidations.  Tube 2 is capable of dry oxidations, wet oxidation and inert anneals.  Tube 3 is used for solid source phosphorus doping.

No volatiles or glass in any tube. CMOS compatible materials only in tube 1. Metals in tube 2 and tube 3 require staff permission.

The Applied Materials P5000 has two dedicated chambers for dielectric PECVD.  One utilizes a TEOS/O2 chemistry for silicon dioxide and the other is SiH4/NH3 capable for silicon nitrides.  Both can process up to 8” wafers and deposit films multiple microns thick.  Nominal operating temperature is ~400C.

No volatiles, toxics, glass or metals without staff permission.

The Allied MultiPrep system enables precise semiautomatic sample preparation of a wide range of materials for microscopic (optical, SEM, FIB, TEM, AFM, etc.) evaluation.

Capabilities include parallel polishing, angle polishing, site-specific polishing or any combination thereof.  Samples up to 3” can be mounted onto the platen assembly and polished with diamond embedded film and/or slurries.

No toxics. 

The AJA Orion system is capable of both RF and DC based magnetron sputtering in a high vacuum turbo pumped chamber.  Four targets are installed concurrently and can enable co-sputtering.  3” samples can be heated, via an IR lamp, up to 600C.

No toxics. 

The general purpose wet bench handles a majority of required aqueous chemistries within the cleanroom.  Small pieces through 8” wafers can be accommodated using various provided PTFE holders.

No solvents or heavy metals.