Annealing
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The Bruce is a high temperature, three tube, atmospheric, horizontal furnace. It can accept up to 5” wafers and has a maximum operating temperature of 1100C. Tube 1 is dedicated to CMOS compatible dry oxidations. Tube 2 is capable of dry oxidations, wet oxidation and inert anneals. Tube 3 is used for solid source phosphorus doping.
No volatiles or glass in any tube. CMOS compatible materials only in tube 1. Metals in tube 2 and tube 3 require staff permission.
Facility