The Bruce is a high temperature, three tube, atmospheric, horizontal furnace.  It can accept up to 5” wafers and has a maximum operating temperature of 1100C.  Tube 1 is dedicated to CMOS compatible dry oxidations.  Tube 2 is capable of dry oxidations, wet oxidation and inert anneals.  Tube 3 is used for solid source phosphorus doping.

No volatiles or glass in any tube. CMOS compatible materials only in tube 1. Metals in tube 2 and tube 3 require staff permission.