Clean Room (MNCR)

This is just a test so that I can build a template for everything.

The Zeiss SUPRA 55 is a FESEM with a Schottky thermal field emission source. It has an ultimate imaging resolution in the range of 2nm. The SUPRA has multiple detectors for Secondary Imaging as well as Backscatter. The system has been setup with a blanker and a control system that can be used for doing electron beam lithography. The Nabity system is able to read standard CAD files, DFX, and GDSII formats. In e-beam lithography mode 20nm-50nm feature sizes are attainable.

The YES oven can accommodate up to 8” wafers and pulls a vacuum level down to ~500mT.  The convective heater can maintain a chamber temperature up to 170C.

This small oven can reach temperature of ~150C while maintaining a vacuum of 22 inHg.

The Trion is an ICP-RIE system with both fluorinated and chlorinated chemistries.  The system has recipes for semiconductor, compound semiconductor, and metal plasma etching.  The ICP option allows for quasi-independent control of plasma density and ion bombardment energy reducing physical damage while retaining high etch rates and selectively.

No toxics.

The Tousimis CPD is used to dry samples and reduce the damage introduced through “air” drying. It can also be used for releasing MEMS devices after their final etch. Staff guidance required.

The TCAR 864 is a diamond bladed programmable dicing saw.  It’s capable of cutting into, or through, multiple types of substrates with industry leading precision.  The machine can handle sample sizes ranging from pieces up to 6” wafers. 

No toxics. 

The Tesmescal is a cryo-pumped high vacuum system for PVD thin films by electron beam evaporation.  Users must provide their own source materials and crucible, if required.  The planetary can accommodate up to 8” samples.

No toxics or gold. 

The Tesmescal is a cryo-pumped high vacuum system for PVD thin films.  Most commonly used as an electron beam technique it is also capable of thermal evaporations for some materials.  Users must provide their own source materials and crucible, if required.  The planetary can accommodate up to 8” samples.

No toxics or copper. 

The Suss probe station allows electrical test of up to 8” wafers using 4 manual micromanipulators.  The test station is also equipped with a heated stage, microscope video system, and an array of electrical test meters.