Deposition
Image
The PicoSun ALD system is capable of running in both thermal and plasma enhanced mode. The sample holder can accept up to 8” wafers and has a maximum operating temperature of 400C although many processes are enabled at significantly lower temps. It’s configured for up to five precursor reagents and 3 plasma gases (N2, H2, and O2). Maximum film thicknesses are typically less than 0.5um.
No volatiles or toxics allowed.
Facility