Microscopy
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The Zeiss 1540EsB Crossbeam is a FIB/SEM system. It has a FESEM electron column which has excellent imaging performance with resolution approaching the 2nm range. It also has a Ga ion column which allows for milling (sputtering) of materials from the sample. The system can also deposit Pt, W, and SiOx from precursors installed in the Gas Injection System. The GIS also has 2 etch gases including XeF2 and H2O. There are multiple detector options for different imaging modes.
Facility