The RPI Semiconductor CoLab Catalyst Seminar Series will kick off Tuesday, January 20th, 3:00–5:00 PM, in person at the ZEN Building, Albany NanoTech Complex. The inaugural seminar will feature Ravishankar Sundararaman (RPI) and Tim Philicelli (IBM) presenting on topological metals, separated by a coffee break for networking, discussions and poster presentations.
Speakers:
Ravishankar Sundararaman, Professor, RPI
Can charge transport in topological metals be protected from scattering?
Timothy Philicelli, Staff Research Scientist, IBM
Characterizing surface states of topological metals for use in next-generation interconnects
About the Series:
The RPI Semiconductor CoLab Catalyst Seminars bring together faculty, researchers, and industry partners to exchange ideas, highlight collaborations, and advance innovation in semiconductors and microelectronics.
Program Format:
Two 45-minute talks with a networking coffee break
Who Should Attend?
The event is open to faculty, students, researchers, alumni, and industry partners at Albany Nanotech Complex.
Participants are welcome to present posters during the break to reach broader audiences.
Registration Information:
The registration deadlines:
Friday, January 2nd for non-US citizens
Tuesday, January 13th for US citizens and US permanent residents
Additional details, such as ID requirements and access to site, are available at the link.
Register here.