MPT Rapid Thermal Anneal

Annealing
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The MPT RTA is a radiation based rapid thermalization tool capable of processing up to 4” wafers.  Offered atmospheric gas ambients include N2 and O2.  Controlled temperature capability runs from 300C to 1000C with exposure durations on the scale of minutes.

No volatiles, toxics, or glass without staff permission.

Current Pricing

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